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HAUS LABS BY LADY GAGA Power Sculpt Velvet Bronzer with Fermented Arnica

HAUS LABS BY LADY GAGA Power Sculpt Velvet Bronzer with Fermented Arnica

HAUS LABS BY LADY GAGA Power Sculpt Velvet Bronzer with Fermented Arnica

    Product Description

    What it is: A cutting-edge, clean bronzing powder that blurs and defines with a natural-looking, second-skin finish.

    Highlighted Ingredients:
    - Fermented Arnica Oil: Rich in antioxidant and soothing properties.
    - Plant Squalane: Nourishes skin.
    - Talc-Free: Maintains moisture.

    Ingredient Callouts: This product is vegan and cruelty-free.

    What Else You Need to Know: This bronzer is infused with HAUS LABS BY LADY GAGA�s patented fermented arnica and delivers skincare benefits without compromising color performance. Its velvety-smooth, weightless, skip-proof formula is unlike any other that effortlessly, visibly defines and sculpts.

    Clean at Sephora
    Clean at Sephora is a curation of brands committed to evolving the beauty industry. When you see our Clean seal, you can be sure this brand's products are formulated without certain ingredients that are potentially harmful to human health and the environment and also address ingredients clients are concerned about, including phthalates, formaldehyde or formaldehyde releasers, oxybenzone and octinoxate, hydroquinone, triclosan, coal tar, methylisothiazolinone and methylchloroisothiazolinone, insoluble plastic microbeads, and more. For the full list, check out the Ingredients tab.

    Suggested Usage:
    -Sweep on desired area for immediate warmth and definition.
    -Build and blend for added dimension.-

    Ingredients:
    -Fermented Arnica Oil: Rich in antioxidant and soothing properties.
    -Plant Squalane: Nourishes skin.
    -Talc-Free: Maintains moisture.

    Synthetic Fluorphlogopite, Calcium Sodium Borosilicate, Squalane, Neopentyl Glycol Dicaprylate/Dicaprate, Hydrogenated Polyisobutene, Mica, Caprylic/Capric Triglyceride, Sorbitan Isostearate, Sodium Hyaluronate, Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate, Arnica Montana Flower Extract**, Tocopherol, Ascorbyl Palmitate, Tocopheryl Acetate, Persea Gratissima (Avocado) Oil, Dimethicone, Hydrogenated Rapeseed Oil, Ethylhexylglycerin, Ethylhexyl Palmitate, Silica, Caprylyl Glycol, Trihydroxystearin, Pentaerythrityl Tetra-Di-T-Butyl Hydroxyhydrocinnamate, Polysorbate 60, Hydrogenated Styrene/Isoprene Copolymer, Ethylene/Propylene/Styrene Copolymer, Butylene/Ethylene/Styrene Copolymer, Bht. May Contain/Peut Contenir: +/- Ci 77891 (Titanium Dioxide), Ci 77491/77492/77499 (Iron Oxides), Ci 77007 (Ultramarines), Ci 19140 (Yellow 5 Lake), Ci 15850 (Red 7 Lake). **Fermented

    Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category�this is not an exhaustive list):
    Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytulolene (BHT) under 0.1%, Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Parrafin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos) , Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1, 4, Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1�4 Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%).

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